Processes

Latest Innovations

Metal-Assisted Chemical Etching ("MacEtch") of Semiconductors

Semiconductor nanostructures have become ubiquitous in consumer electronics, sensing applications, specialized and high-performance materials, and more. These structures...

Strong, Reusable, Surface-Agnostic Adhesives via Shape Memory Polymers

Surface adhesion is a ubiquitous need for consumer, manufacturing, and industrial applications. Whether hanging art on the wall, enabling pick-and-place robotics, or...

Method for Growing a Polarization Free GaN-Based Laser Diode

Prof. Bayram from the University of IL has developed a method of depositing (growing) GaN on silicon substrates with complete surface coverage of cubic phase GaN. 
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MacEtch Method Using CMOS Compatible catalyst TiN

 

 

Dr. Xiuling Li from the University of IL has developed a new MacEtch method using TiN as the metal catalyst. Compared with conventional MacEtch catalysts,...

Polarization Dependent Damage-Free Laser-Assisted Plasma Etching

Drs. David Ruzic and Jason Peck from the University of Illinois at Urbana-Champaign have developed a new plasma etching process assisted by a polarized pulsed laser. This...

Carbon Nanotube Portfolio for Manufacturing Applications

This portfolio includes carbon nanotube growth and processing methods relevant to nanotube manufacturing....

Suite of Bioresorbable and Transient Electronics

Optical Inspection of Nanoscale Structures using a Novel Machine Learning Based Synthetic Image Generation Algorithm

Semiconductor defect detection using Machine Learning

Dr. Goddard and Dr. Schwing have developed a machine learning technique which requires only...

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