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Area Selective CVD metal deposition for Molybdenum, Iron, and Ruthenium

Area Selective CVD metal deposition for Molybdenum, Iron, and Ruthenium [1]

Dr. John Abelson has developed an area selective CVD metal deposition technology.  This technology can selectively deposit thin metal layer on a surface. By using inhibitor, one can precisely deposit metal layer only on the position user wants. This technique can save steps in current metal deposition and metal patterning process, thus reducing manufacturing cost.

John
Abelson

Inventors:

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Source URL:https://origin.otm.illinois.edu/technologies/area-selective-cvd-metal-deposition-molybdenum-iron-and-ruthenium

Links
[1] https://origin.otm.illinois.edu/technologies/area-selective-cvd-metal-deposition-molybdenum-iron-and-ruthenium