UIUC Office of Technology Management
Published on UIUC Office of Technology Management (https://origin.otm.illinois.edu)

Home > Method for Growing a Polarization Free GaN-Based Laser Diode

Method for Growing a Polarization Free GaN-Based Laser Diode

Method for Growing a Polarization Free GaN-Based Laser Diode [1]

Prof. Bayram from the University of IL has developed a method of depositing (growing) GaN on silicon substrates with complete surface coverage of cubic phase GaN. 

This technology provides a new method of integrating GaN photonics with silicon electronics. 

Applications are in light emitting diodes and transistors. 

Publication: Richard Liu and Can Bayram, "Aspect Ratio Optimization of cubic phase GaN on patterned silicon substrate using phase transition", Appl.Phys. Lett. To be submitted.

Can
Bayram

Inventors:

US Pat #: 
10027086
Issue Date: 
7/17/2018
The Office of Technology Management
319 Ceramics Building
105 South Goodwin Avenue
Urbana, IL 61801
Phone: 217.333.7862
Fax: 217.265.5530
Email: otm@illinois.edu

Source URL:https://origin.otm.illinois.edu/technologies/method-growing-polarization-free-gan-based-laser-diode

Links
[1] https://origin.otm.illinois.edu/technologies/method-growing-polarization-free-gan-based-laser-diode